Electornics
Trusted Chemistry for the World’s Most Advanced Semiconductors
At Survival Technologies Pvt. Ltd., we drive progress in the semiconductor industry with cutting-edge specialty chemicals engineered for unmatched performance, precision, and purity.
Our materials form the backbone of modern technology-powering innovations in microchips, displays, sensors, and next-generation electronics. With a steadfast focus on innovation, reliability, and compliance, we help global manufacturers achieve greater efficiency, stability, and scalability across every process.
Supported by robust R&D, regulatory-compliant manufacturing, and a strong commitment to sustainability, we deliver consistent quality that meets the most rigorous industry standards. From research labs to large-scale production, our solutions enable the technologies shaping the future.
Discover how Survival Technologies is redefining the boundaries of semiconductor chemistry.
| Application | Chemical | CAS Number | Potential Applications |
|---|---|---|---|
| Thin Film Deposition & Surface Treatment | Tert-butylimido tris(methylethylamino)niobium | 864150-47-0 | Precursor for thin films in CVD/ALD, highk dielectric materials, metal nitrides |
| Allyltrimethylsilane | 762-72-1 | Surface treatment and thin-film deposition in semiconductor fabrication | |
| Dielectric Materials | 2,2-Bis(3,4-dimethylphenyl)hexafluoropropane | 65294-20-4 | Dielectric material for microelectronics, insulating layers |
| Photoresist & Lithography | 2,4,6-Triisopropylbenzenesulfonyl chloride | 6553-96-4 | Intermediate for photoresist materials in semiconductor lithography |
| Hexamethyldisilazane (HMDS) | 999-97-3 | Adhesion promoter for photoresists in photolithography | |
| Catalysts | Aluminium Trifluoromethane Sulfonate | 74974-61-1 | Catalyst in electronics due to thermal and chemical stability |
| Iron(III) Triflate | 63295-48-7 | Lewis acid catalyst in organic synthesis for electronic materials | |
| Trifluoromethanesulfonic Acid (Triflic Acid) | 1493-13-6 | Strong acid catalyst in microelectronics, etching, and deposition processes | |
| Trifluoromethanesulfonic Anhydride | 358-23-6 | Used in the synthesis of semiconducting materials | |
| Battery Technology | Lithium Trifluoromethanesulfonate (Lithium Triflate) | 33454-82-9 | Electrolyte in lithium-ion batteries and electrochemical applications |
| Conductive Materials | Copper Iodide | 7681-65-4 | Conductive materials in microelectronics, dopant in semiconductor devices |
| Energy Storage & Electrolytes | Potassium tris(trifluoromethylsulfonyl)met hide | 114395-69-6 | Electrolyte component in lithium-ion batteries, energy storage devices |
| Organic Semiconductors | Quinolinic Acid | 89-00-9 | Organic semiconductors, materials for LEDs |
| Polymeric & Crosslinking Agents | Divinyl Sulfone | 77-77-0 / 1,1,1 | Crosslinking agent in electronic devices, polymeric materials |
| Adhesives & Coatings | Trimethoxyethane | 1445-45-0 | Protective coatings and other processes during semiconductor production |
| Solar Cells & Photoactive Materials | 6-Bromo-2-naphthol | 15231-91-1 | Dye-sensitized solar cells, photoactive materials for organic electronics |
| Advanced Materials Synthesis | N,N'-Diisopropylcarbodiimide | 693-13-0 | Formation of advanced materials and intermediates for semiconductor manufacturing |
| Surface Modification & Functionalization | Bis-(trifluoroacetoxy)-iodobenzene | 2712-78-9 | Reagent for surface modification, functionalization of substrates in semiconductor processes |
| Corrosion Inhibitors & Ligands | Quinaldic acid | 93-10-7 | Ligand in metal complexation, corrosion inhibitors |
| Lubricants & Heat Transfer Fluids | Di-p-tolyl Ether | 1579-40-4 | High-temperature lubricant, heat transfer fluid, solvent/plasticizer in flexible electronics |
| Electroplating & Conductive Films | Tetrafluoroboric Acid | 16872-11-0 | Used in electroplating of semiconductor materials, production of conductive films |